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A Canadian research firm, Advances in Engineering, interested in the research article by Prof. Washio and others

2015/06/23

A research paper on the high-quality ZnO heteroepitaxial growth on c-face sapphire substrate by Prof. Katsuyoshi Washio, Assist. Prof. Tomoyuki Kawashima and others (Graduate School of Engineering, Tohoku University) was presented on the website of a Canadian research firm, Advances in Engineering (AIE), as noteworthy engineering results on June 17. (https://advanceseng.com/general-engineering/low-temperature-heteroepitaxial-growth-of-single-domain-v-doped-zno-films-on-c-face-sapphire/
 
AIE posts exceptional research results from major scientific journals on its website. AIE introduces them to private enterprises world-wide and provides consulting and matching services. AIE is interested in the following article published by Prof. Washio et al. in 2015; Prof. Washio and others who found the incorporation of transition metal, Vanadium, gave good crystallinity of ZnO thin film grown on c-face sapphire.
 
A fact that an independent organization overseas has expressed interest in the material proves the importance of practical and applicable research.
 
Presented article: "Low-temperature heteroepitaxial growth of single-domain V-doped ZnO films on c -face sapphire", H. Chiba, T. Mori, T. Kawashima, K. Washio.
 
Journal of Electronic Materials, 44, 1351-1356 (2015).
[DOI: 10.1007/s11664-014-3587-2]
 
 
[Contact:]
Division of Public Relations School of Engineering, Tohoku University
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